Ionized Water devices

Cleaning Method in Semicondudtor EWS. High end semiconductor cleaning, change the method as eco-friendly ionizes water.

Products

  • Alkaline Water Ionizer WIZ.on
  • STERION-S Ionized Water Devices for Semiconductor Cleaning
  • STERION-M Sterilizing solution system for Medication
  • STERION-F Ionized Water Devies for Food/Dairy/Agriculture
  • Technic al Reference
  • Media Center

STERION-S Ionized Water Devices for Semiconductor Cleaning

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Problem of conventional cleaning method

Cleaning principle by REOX® water

Comparison to current cleaning method

Current technology Electrolysis technology
Based technology Chemical cleaning Ionized water cleaning
Next goal Reducing chemical Non chemical, only UPW
Components per chip Difficult to clean as components high Limitless Cleaning
Waste water Toxic waste water produced No toxic waste water
Number of process Many number of process Number of process can be reduced.
Consumtion of DIW Much DIW is used for Rinse and dilution of chemical Small consumtion, No need to rinse and dilution

Cleaning Effect by ionized water

Specification

Model No. Capacity Capacity/hour Pipe Material pH Range Dimension
STERION-S 1000 10LPM 0.6 t PTFE 2.7~11.5 700(W) * 2200(H) * 700(D)
STERION-S 2000 20LPM 1.2 t PTFE 2.7~11.5 700(W) * 2200(H) * 700(D)
STERION-S 3000 30LPM 1.8 t PTFE 2.7~11.5 700(W) * 2200(H) * 700(D)